On the morning of May 10, the 2018 Workshop on Low Dimensional Semiconductor Nanostructures and Integrated Devices, and the Opening Ceremony of the Sino-German Cooperation Group: On-Chip Integrated Photonics Based on Semiconductor Nanostructures were held in Hunan University (HNU). Experts and scholars from US, Germany, Singapore, and China attended.
Duan Xianzhong, HNU president, and Mr. Zhao Chuan from Sino-German Center for Research Promotion (SGC) were present at the unveiling ceremony. The event was attended by Deng Xianjue, director of Science & Technology International and Regional Cooperation Division of the Hunan Provincial Science & Technology Department, Mr. Alfred J. Meixner, German side director of Sino-German Cooperation Group and professor of the University of Tübingen, Prof. Zhang Hua from Nanyang Technological University, and Prof. He Jun from National Center for Nanoscience and Technology.
The workshop was chaired by Pan Anlian, Chinese side director of Sino-German Cooperation Group and professor of HNU College of Material Science and Engineering.
The establishment of the Cooperation Group aims to further promote bilateral and multilateral cooperation between China and Germany in this field.
At the workshop, Chinese and overseas experts and scholars focused on the core issues of the study of low dimensional materials. They conducted in-depth discussions on controllable preparation and physical characterization of materials, and preparation and mechanism of new integrated photoelectric devices.
More than 20 internationally known experts gave lectures, including Prof. Alfred J. Meixner of the University of Tübingen; a professor from Leibniz Institute for New Materials; Prof. Zhang Hua from Nanyang Technological University; Prof. Wang John, head of the Department of Materials Science and Technology of the National University of Singapore; and, Duan Xiangfeng and Ritesh Agarwal, HNU distinguished professors.